Table 1

PSZT thin film deposition conditions
Target (Pb0.92Sr0.08)(Zr0.65Ti0.35)O3
Target diameter 100 mm
RF power 100 W
Target to substrate distance 70 mm
Process gas 10% oxygen in argon
Base pressure 9.0 × 10−6 Torr
Sputtering pressure 1.0 × 10−2 Torr

Sriram et al.

Sriram et al. Nanoscale Research Letters 2008 4:29-33   doi:10.1007/s11671-008-9197-2

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