Table 1
PSZT thin film deposition conditions
Target	(Pb0.92Sr0.08)(Zr0.65Ti0.35)O3
Target diameter	100 mm
RF power	100 W
Target to substrate distance	70 mm
Process gas	10% oxygen in argon
Base pressure	9.0 × 10−6 Torr
Sputtering pressure	1.0 × 10−2 Torr

Sriram et al. Nanoscale Research Letters 2008 4:29   doi:10.1186/1556-276X-4-29