Effect of Aspect Ratio on Field Emission Properties of ZnO Nanorod Arrays
1 School of Physical Science and Technology, Suzhou University, Suzhou, Jiangsu Province, 215006, People’s Republic of China
2 CAS Key Laboratory of Organic Solid, Beijing National Laboratory for Molecular Sciences (BNLMS), Institute of Chemistry, Chinese Academy of Sciences, Beijing, 100190, People’s Republic of China
Nanoscale Research Letters 2008, 3:303-307 doi:10.1007/s11671-008-9154-0Published: 16 August 2008
ZnO nanorod arrays are prepared on a silicon wafer through a multi-step hydrothermal process. The aspect ratios and densities of the ZnO nanorod arrays are controlled by adjusting the reaction times and concentrations of solution. The investigation of field emission properties of ZnO nanorod arrays revealed a strong dependency on the aspect ratio and their density. The aspect ratio and spacing of ZnO nanorod arrays are 39 and 167 nm (sample C), respectively, to exhibit the best field emission properties. The turn-on field and threshold field of the nanorod arrays are 3.83 V/μm and 5.65 V/μm, respectively. Importantly, the sample C shows a highest enhancement of factorβ, which is 2612. The result shows that an optimum density and aspect ratio of ZnO nanorod arrays have high efficiency of field emission.