Open Access Nano Express

Fractal Nanotechnology

GF Cerofolini1, D Narducci1, P Amato2 and E Romano1*

Author Affiliations

1 CNISM and Department of Materials Science, University of Milano–Bicocca, Via Cozzi 53, 20125, Milano MI, Italy

2 Numonyx, 20041, Agrate Brianza MI, Italy

For all author emails, please log on.

Nanoscale Research Letters 2008, 3:381-385  doi:10.1007/s11671-008-9170-0

Published: 23 September 2008

Abstract

Self-similar patterns are frequently observed in Nature. Their reproduction is possible on a length scale 102–105 nm with lithographic methods, but seems impossible on the nanometer length scale. It is shown that this goal may be achieved via a multiplicative variant of the multi-spacer patterning technology, in this way permitting the controlled preparation of fractal surfaces.

Keywords:
Spacer technology; Nanofabrication; Crossbar structure; Sub-lithographic preparation; Fractals