Fabrication of Large Area Periodic Nanostructures Using Nanosphere Photolithography
Electrical Engineering and Computer Science Department, Northwestern University, 2145 Sheridan Rd, Evanston, IL, 60208, USA
Nanoscale Research Letters 2008, 3:351-354 doi:10.1007/s11671-008-9164-yPublished: 9 September 2008
Large area periodic nanostructures exhibit unique optical and electronic properties and have found many applications, such as photonic band-gap materials, high dense data storage, and photonic devices. We have developed a maskless photolithography method—Nanosphere Photolithography (NSP)—to produce a large area of uniform nanopatterns in the photoresist utilizing the silica micro-spheres to focus UV light. Here, we will extend the idea to fabricate metallic nanostructures using the NSP method. We produced large areas of periodic uniform nanohole array perforated in different metallic films, such as gold and aluminum. The diameters of these nanoholes are much smaller than the wavelength of UV light used and they are very uniformly distributed. The method introduced here inherently has both the advantages of photolithography and self-assembled methods. Besides, it also generates very uniform repetitive nanopatterns because the focused beam waist is almost unchanged with different sphere sizes.