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Formation and Organization of Amino Terminated Self-assembled Layers on Si(001) Surface

G Demirel*, MO Çağlayan, B Garipcan, M Duman and E Pişkin

Author Affiliations

Department of Chemical Engineering and Division of Bioengineering, Hacettepe University, Beytepe, Ankara, 06800, Turkey

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Nanoscale Research Letters 2007, 2:350-354  doi:10.1007/s11671-007-9071-7

Published: 29 June 2007


We have investigated the effects of dipping time, solution concentration and solvent type on the formation of self-assembled monolayers with aminosiloxane molecules (i.e.,N-(3 trimethoxysilylpropyl)diethylenetriamine (TPDA)) on the Si(001) surface. Studies performed with an ellipsometer showed that monolayers with a thickness of about 1.2 nm were formed when the dipping time is about 2 h, while multilayer were observed for longer time periods. The effect of the TPDA concentration on the thickness of the deposited layer was not very profound, however, the contact angle data exhibit importance of concentration on the surface coverage. The type of the solvent used in the formation of the monolayers was found an important parameter. Monolayers were formed with solvent having larger dielectric constants. Relatively thick multilayer was observed when benzene was used as the solvent, due to its quite low dielectric constant (hydrophobicity).

N-(3-Trimethoxysilylpropyl)diethylenetriamine (TPDA); Hydroxylated silicon; Self-assembled monolayer; Ellipsometry; Si(001) surface