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Open Access Nano Express

Evolution of wetting layer in InAs/GaAs quantum dot system

YH Chen*, XL Ye and ZG Wang

Author Affiliations

Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing, 100083, P.R. China

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Nanoscale Research Letters 2006, 1:79-83  doi:10.1007/s11671-006-9013-9

The electronic version of this article is the complete one and can be found online at:


Published:26 July 2006

© 2006 to the authors

Abstract

For InAs/GaAs quantum dot system, the evolution of the wetting layer (WL) with the InAs deposition thickness has been studied by reflectance difference spectroscopy (RDS). Two transitions related to the heavy- and light-hole in the WL have been distinguished in RD spectra. Taking into account the strain and segregation effects, a model has been presented to deduce the InAs amount in the WL and the segregation coefficient of the indium atoms from the transition energies of heavy- and light-holes. The variation of the InAs amount in the WL and the segregation coefficient are found to rely closely on the growth modes. In addition, the huge dots also exhibits a strong effect on the evolution of the WL. The observed linear dependence of In segregation coefficient upon the InAs amount in the WL demonstrates that the segregation is enhanced by the strain in the WL.

Keywords:
Quantum dots; Wetting layer; Reflectance difference spectroscopy; Segregation; 78.67.Hc; 68.65.Hb; 73.21.Fg

Nano Express

[1-20]

Acknowledgment

The work was supported by the National Natural Science Foundation of China (Nos. 60390074 and 60576062).

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